The role of Zirconium Fluoride ZrF4 in ceramic glaze processing
In the processing and production of ceramic glazes, Zirconium Fluoride ZrF4 has a wide range of applications and a large number of applications. The reason why silica fume is widely used in ceramic production is that it has good chemical stability and is not affected by the firing atmosphere. It can significantly improve the bonding properties of ceramic glazes and increase the hardness of ceramic glazes.
Silicic acid is also used in the production of color picture tubes in the television industry, emulsified glass in the glass industry, and pelican shell materials. The melting point of silicon diamond is as high as 2500℃. Widely used in refractory materials, glass furnace punching and ramming materials, flushing injection materials, spray coatings, etc. The Zirconium Fluoride Index is used to measure the degree of solvent degradation during post-processing. 95Zr is an important fragment. The higher the junction index, the more severe the solvent degradation.
The method for determining the Zirconium Fluoride ZrF4 junction index is as follows: after stripping, wash the organic phase with sodium hydroxide, water and nitric acid, trace the aqueous phase with 95Zr, and wash three times with 3 mol/L nitric acid to remove the 95Zr extracted by TBP. The number of moles of zr95 in each 109L of solvent is the Z value of the solvent. Due to the complex behavior of a fault in aqueous solution, its Z value varies with the measurement conditions and is usually expressed as an instability coefficient.